{"id":2921,"date":"2025-09-08T19:27:38","date_gmt":"2025-09-08T19:27:38","guid":{"rendered":"https:\/\/ontoinnovation.com\/?post_type=resources&p=2921"},"modified":"2025-09-29T17:13:24","modified_gmt":"2025-09-29T17:13:24","slug":"enhancing-cmp-process-control-with-intelligent-line-monitoring-integrated-metrology","status":"publish","type":"resources","link":"https:\/\/ontoinnovation.com\/resources\/enhancing-cmp-process-control-with-intelligent-line-monitoring-integrated-metrology\/","title":{"rendered":"Enhancing CMP Process Control with Intelligent Line Monitoring & Integrated Metrology"},"content":{"rendered":"\n\n \n\n\n\n
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As semiconductor manufacturers push the boundaries of performance and functionality\u2014driven by high-performance computing and AI applications\u2014chemical mechanical planarization (CMP) processes increase in intensity complexity.\u00a0<\/strong><\/p>\n

New logic transistor designs, 3D NAND stacking, and DRAM integration introduce more CMP layers and tighter process windows. Traditional metrology approaches struggle to keep pace, especially with the need for high sampling rates, multiple control zones, and improved signal-to-noise ratios.<\/p>\n\n <\/div>\n

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Onto Innovation\u2019s Intelligent Line Monitoring & Control with Integrated Metrology offers a transformative approach to CMP process control.<\/p>\n

By leveraging data feedforward from standalone metrology tools to integrated metrology systems, this solution enables real-time, AI-driven process optimization.<\/p>\n

At the heart of this solution is the IMPULSE\u00ae V system, an advanced integrated metrology platform that connects with standalone tools like the Atlas\u00ae system and utilizes Ai Diffract\u2122 modeling software.<\/p>\n

This ecosystem enables the creation of hybrid reference models\u2014combining standalone data and limited TEM measurements\u2014to drive high-precision, high-throughput results.<\/p>\n

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Key Benefits<\/h2>\n\n <\/div>\n <\/div>\n \n <\/div>\n <\/div>\n<\/section>\n\n\n\n\n\n \n\n\n\n
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Accelerated Time to Solution:<\/strong>\u00a0Feedforward of secondary parameters from standalone tools into IMPULSE system recipes enables faster model convergence and process tuning.<\/p>\n

Improved Throughput:<\/strong>\u00a0Skipping pre-measurements at the integrated metrology stage saves time without compromising accuracy<\/p>\n\n <\/div>\n <\/div>\n \n

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Reduced Cost and TEM Dependency:<\/strong>\u00a0Hybrid reference modeling minimizes the need for extensive TEM data, reducing both cost and development time.<\/p>\n

Enhanced Process Control:<\/strong>\u00a0AI-driven analytics and model-based feedback improve excursion detection and process stability, leading to better Cpk performance.<\/p>\n\n <\/div>\n <\/div>\n \n <\/div>\n <\/div>\n<\/section>\n\n\n\n\n\n \n\n\n\n

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In-Fab Use Case<\/strong><\/h3>\n
MX PST-POL Full Loop<\/h5>\n

In a production environment, Onto Innovation demonstrated the power of feedforward data integration by correlating oxide loss measurements across standalone and integrated metrology tools. By feeding forward key parameters, the solution eliminated the need for redundant pre-measurements and improved correlation to reference data\u2014delivering both time savings and enhanced process control.\"\"<\/p>\n\n <\/div>\n <\/div>\n \n <\/div>\n <\/div>\n<\/section>\n\n\n\n\n

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You Have\u2028a Challenge? Let\u2019s talk.<\/h2>\n \n

We\u2019d love to connect with you.<\/p>\n<\/div>\n \n

Looking to learn more about our innovative solutions and capabilities? Our team of experts is ready to assist you. Reach out today and let\u2019s starts a conversation about how we can help you achieve your goals.<\/p>\n<\/div>\n \n <\/div>\n

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